Resist materials
US5135838A · kind A · utility
23Cited by
7References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 9, 1990 |
| Grant date | Aug 4, 1992 |
| Priority date | — |
| Expiry date | Aug 9, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A class of resist compositions sensitive to deep ultraviolet radiation includes a resin sensitive to acid and a composition that generates acid upon exposure to such radiation. A group of nitrobenzyl materials is particularly suitable for use as the acid generator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.