Cleaning brush for semiconductor wafer
US5144711A · kind A · utility
64Cited by
6References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 25, 1991 |
| Grant date | Sep 8, 1992 |
| Priority date | — |
| Expiry date | Mar 25, 2011 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B1/36
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Apparatus for cleaning an offset semiconductor wafer includes first and second opposed brushes circumscribing a common drive shaft. The wafer includes a circular peripheral edge. At any given instant, a first portion of the offset semiconductor wafer is positioned between and contacts the brushes while the second remaining portion of the semiconductor wafer extends outwardly from between the brushes. The peripheral edge of the second portion of the wafer contacts and is turned by a rotating support member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.