Tube and injector for preheating gases in a chemical vapor deposition reactor
US5146869A · kind A · utility
23Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 11, 1990 |
| Grant date | Sep 15, 1992 |
| Priority date | — |
| Expiry date | Jun 11, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/912
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas injector apparatus and process, having a gas injector tube ending at the top of a vertical reaction chamber, improves the thickness and resistivity uniformity of films deposited in CVD process reactors. The injection tube has a plurality of baffles to increase the residence time of reactant gases flowing toward the reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.