Steven Reder
22Patents
8h-index
19Co-inventors
72Inventor score
Filing activity: Jun 11, 1990 → Feb 25, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6837967B1 | Method and apparatus for cleaning deposited films from the edge of a wafer | Electricity | 53 | Expired |
| US5146869A | Tube and injector for preheating gases in a chemical vapor deposition reactor | Emerging Cross-Sectional Technologies | 23 | Expired |
| US6739953B1 | Mechanical stress free processing method | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6874510B2 | Method to use a laser to perform the edge clean operation on a semiconductor wafer | Electricity | 13 | Expired |
| US6982206B1 | Mechanism for improving the structural integrity of low-k films | Electricity | 13 | Expired |
| US8404960B2 | Method for heat dissipation on semiconductor device | Electricity | 11 | Active |
| US8653357B2 | Method for heat dissipation on semiconductor device | Electricity | 10 | Active |
| US6650958B1 | Integrated process tool monitoring system for semiconductor fabrication | Emerging Cross-Sectional Technologies | 8 | Expired |
| US7332062B1 | Electroplating tool for semiconductor manufacture having electric field control | Chemistry; Metallurgy | 8 | Expired |
| US6328347A | Uniform axial loading ground glass joint clamp | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6649537B1 | Intermittent pulsed oxidation process | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7198546B2 | Method to monitor pad wear in CMP processing | Performing Operations; Transporting | 5 | Expired |
| US6635116B1 | Residual oxygen reduction system | Electricity | 3 | Expired |
| US6355577B1 | System to reduce particulate contamination | Electricity | 3 | Expired |
| US6574525B1 | In situ measurement | Electricity | 2 | Expired |
| US6869893B2 | Laminate low K film | Electricity | 2 | Expired |
| US6971944B2 | Method and control system for improving CMP process by detecting and reacting to harmonic oscillation | Performing Operations; Transporting | 1 | Expired |
| US7183787B2 | Contact resistance device for improved process control | Electricity | 0 | Expired |
| US6743701B1 | Method for the formation of active area utilizing reverse trench isolation | Electricity | 0 | Expired |
| US6927177B2 | Chemical mechanical electropolishing system | Emerging Cross-Sectional Technologies | 0 | Expired |
| US7067048B2 | Method to improve the control of electro-polishing by use of a plating electrode an electrolyte bath | Chemistry; Metallurgy | 0 | Expired |
| US7314527B1 | Reactor system | Mechanical Engineering; Lighting; Heating | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.