Semiconductor wafer
US5147824A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 16, 1991 |
| Grant date | Sep 15, 1992 |
| Priority date | — |
| Expiry date | Aug 16, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/219
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor wafer having a mark indicating a specified crystal orientation is disclosed. In a preferred embodiment, first and second notches are provided on a circular outer periphery of the semiconductor wafer. A line coupling the vertices of the first and second notches indicates the crystal orientation of the semiconductor wafer. By using such notches as marks for identifying the crystal orientation, the loss of useful area of the semiconductor wafer can be reduced. Generation of slip lines which are crystal defects can be suppressed. Such notches can be formed on the bar member before slicing. By providing the notches on the bar member before individual wafers are cut therefrom, it becomes unnecessary to provide notches on the individual semiconductor wafers one by one.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.