Apparatus for cleaning a substrate
US5158616A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 29, 1991 |
| Grant date | Oct 27, 1992 |
| Priority date | — |
| Expiry date | Oct 29, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A cleaning apparatus is disclosed which is used in a manufacturing process of a semiconductor device. A plurality of treatment chambers are vertically mounted in a parallel array along a path of carriage of a substrate to be treated. One sheet of substrate is held within one of the treatment chambers at a time. The width of the treatment chamber is so small as to properly contain the substrate in a direction of the thickness of the substrate and hence the whole length of the cleaning apparatus can be made smaller. The substrate is held by a universally-jointed arm which is mounted on a carrier, and inserted/withdrawn into/out of the treatment chamber by that arm. The treatment chamber is of the type wherein a substrate is immersed into a cleaning solution, a support base is mounted therein to maintain the substrate vertically, and an ultrasound oscillation source is provided therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.