Optical projection system
US5159172A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 7, 1990 |
| Grant date | Oct 27, 1992 |
| Priority date | — |
| Expiry date | Aug 7, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70358
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system having a plurality of substantially planar reflecting surfaces and a plurality of curved reflecting surfaces providing an optical projection system which can scan a mask object onto an image plane by having the mask and copy substrate substantially fixed in position relative to each other and either simultaneously moving the mask and copy substrate in the same direction or maintaining the mask and image plane substantially stationary and fixed with respect to each other while scanning the optical system. The optical system uses one wavelength of an electromagnetic radiation to align the mask to the copy substrate and another wavelength of electromagnetic radiation to form the image of the mask on the copy substrate. The apparatus can be used as a laser ablation optical tool to laser ablate the image of a mask onto the copy substrate, as an inspection tool, as a photolithographic and for other related applications. The projection lens is a modified Dyson type lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.