1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds

US5162190A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Wolfgang Zahn
• Gerhard Buhr · Königstein, DE
• Hartmut Steppan · Wiesbaden, DE

Key dates

• Filing date: Jun 29, 1989
• Grant date: Nov 10, 1992
• Expiry date: Jun 29, 2009

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/022
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

A compound of the general formula I ##STR1## in which D denotes a 1,2-naphthoquinone-2-diazide-4-sulfonyl or - 5-sulfonyl radical, PA0 R.sup.1 denotes an alkylene group and PA0 R.sup.2 denotes a hydrogen atom, an alkyl group or a group R.sup.1 --OH, or of the general formula II ##STR2## in which X denotes an alkylene group, an arylene group or a group of the formula EQU NH--Y--NH, PA0 wherein Y is an alkylene group or an arylene group, PA0 R.sup.3 denotes an alkylene group, which may be interrupted by ether oxygen atoms, PA0 n is a number from 1 to 40 and PA0 m is a number from 0 to 50, the ratio m:(m+n) being from 0:100 to 95:100 and R.sup.1 and D having the above-indicated meaning, are disclosed. The compounds may be used in positive-working photosenitive materials for the production of printing plates and photoresists. Compounds according to formula II do not require an addition of polymeric binders.