Apparatus for the reactive coating of a substrate
US5169509A · kind A · utility
68Cited by
5References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 1991 |
| Grant date | Dec 8, 1992 |
| Priority date | — |
| Expiry date | May 9, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3429
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A pair of magnetron cathodes in an evacuable coating chamber are each connected to an ungrounded output of an A.C. power supply. The discharge voltage of at least one of the cathodes is measured and the flow of reactive gas into the chamber is controlled so that the measured voltage is identical to a desired voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.