Positive type and negative type ionization irradiation sensitive and/or deep U.V. sensitive resists comprising a halogenated resin binder
US5169740A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 1990 |
| Grant date | Dec 8, 1992 |
| Priority date | — |
| Expiry date | Mar 29, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/167
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Resist containing novolak prepared by condensating halogenated phenol represented by the following formula (III) and one or more phenol derivatives selected from the group consisting of cresol, xylenol, tet-butylphenol and propenylphenol, with a carbonyl compound ##STR1## wherein R.sub.3 is an halogen atom selected from the group consisting of F, Cl, and Br. If the resist is used as a positive-type one, it further contains a photo-sensitive agent, and R.sub.3 in the formula (III) is either F or Br. If the resist is used as a negative-type one, it further contains a photosensitive agent and/or a sensitizer, and R.sub.3 in the formula (III) is either Cl or Br.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.