Toru Ushirogouchi
52Patents
16h-index
44Co-inventors
84Inventor score
Filing activity: May 13, 1988 → Aug 12, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6025117A | Method of forming a pattern using polysilane | Physics | 348 | Expired |
| US6303266A | Resin useful for resist, resist composition and pattern forming process using the same | Emerging Cross-Sectional Technologies | 83 | Expired |
| US5691101A | Photosensitive composition | Emerging Cross-Sectional Technologies | 47 | Expired |
| US6280897A | Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts | Emerging Cross-Sectional Technologies | 39 | Expired |
| US5348838A | Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group | Emerging Cross-Sectional Technologies | 33 | Expired |
| US6197473A | Photosensitive composition and a pattern forming process using the same | Emerging Cross-Sectional Technologies | 25 | Expired |
| US5837419A | Photosensitive composition | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6959986B2 | Liquid ink and recording apparatus | Chemistry; Metallurgy | 24 | Expired |
| US4988601A | Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol | Physics | 23 | Expired |
| US6440636B1 | Polymeric compound and resin composition for photoresist | Chemistry; Metallurgy | 23 | Expired |
| US4871646A | Polysilane compound and photosensitive composition | Physics | 22 | Expired |
| US6824957B2 | Resin useful for resist, resist composition and pattern forming process using the same | Emerging Cross-Sectional Technologies | 21 | Expired |
| US5372914A | Pattern forming method | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6060207A | Photosensitive material | Emerging Cross-Sectional Technologies | 19 | Expired |
| US6071670A | Transparent resin, photosensitive composition, and method of forming a pattern | Emerging Cross-Sectional Technologies | 18 | Expired |
| US5932391A | Resist for alkali development | Emerging Cross-Sectional Technologies | 17 | Expired |
| US6228552A | Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material | Physics | 16 | Expired |
| US7803851B2 | Inkjet ink | Chemistry; Metallurgy | 16 | Active |
| US6045968A | Photosensitive composition | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6541597B2 | Resin useful for resist, resist composition and pattern forming process using the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6660450B2 | Resin useful for resist, resist composition and pattern forming process using the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US5928841A | Method of photoetching at 180 to 220 | Physics | 10 | Expired |
| US7500745B2 | Liquid ink and recording apparatus | Chemistry; Metallurgy | 9 | Active |
| US5169740A | Positive type and negative type ionization irradiation sensitive and/or deep U.V. sensitive resists comprising a halogenated resin binder | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6291129A | Monomer, high molecular compound and photosensitive composition | Emerging Cross-Sectional Technologies | 8 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.