Exposure method and apparatus
US5171965A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1991 |
| Grant date | Dec 15, 1992 |
| Priority date | — |
| Expiry date | Dec 23, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and an apparatus for exposing an object with a pulsed laser beam. The exposure of one shot (one exposure area) is achieved by a plurality of pulse exposures with laser light in a corresponding number of pulses, as the result of which any fluctuations or errors in the outputs of the pulses are substantially compensated so that correct exposure of each shot is assured. In another aspect, the amounts of exposures by the plural pulses for the one shot exposure are integrated and the integrated amount of exposure is compared with a correct or desired amount of exposure. On the basis of the result of comparison, an additional pulse exposure is effected in accordance with the degree of under exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.