Exposure apparatus
US5172402A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 8, 1991 |
| Grant date | Dec 15, 1992 |
| Priority date | — |
| Expiry date | Mar 8, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/702
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.