Positive type photoresist developer
US5175078A · kind A · utility
26Cited by
5References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1992 |
| Grant date | Dec 29, 1992 |
| Priority date | — |
| Expiry date | Mar 18, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive type photoresist developer which comprises an aqueous solution of quaternary ammonium hydroxide represented by the general formula; ##STR1## (wherein all the symbols are as defined in the appended claims) and hydrazine or hydrazine and a nonionic surfactant is disclosed. The developer can form a fine pattern having a high degree of resolution and can provide an excellent profile with few irregularities in pattern dimensions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.