Tetsuo Aoyama
36Patents
16h-index
79Co-inventors
84Inventor score
Filing activity: May 6, 1975 → Jul 16, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5242879A | Active carbon materials, process for the preparation thereof and the use thereof | Chemistry; Metallurgy | 140 | Expired |
| US5972862A | Cleaning liquid for semiconductor devices | Electricity | 124 | Expired |
| US5630904A | Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent | Emerging Cross-Sectional Technologies | 54 | Expired |
| US6372410B1 | Resist stripping composition | Chemistry; Metallurgy | 52 | Expired |
| US5174816A | Surface treating agent for aluminum line pattern substrate | Electricity | 45 | Expired |
| US5962385A | Cleaning liquid for semiconductor devices | Electricity | 38 | Expired |
| US7250391B2 | Cleaning composition for removing resists and method of manufacturing semiconductor device | Electricity | 35 | Expired |
| US6638694B2 | Resist stripping agent and process of producing semiconductor devices using the same | Physics | 33 | Expired |
| US6265309A | Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same | Emerging Cross-Sectional Technologies | 28 | Expired |
| US5175078A | Positive type photoresist developer | Physics | 26 | Expired |
| US7399365B2 | Aqueous fluoride compositions for cleaning semiconductor devices | Chemistry; Metallurgy | 19 | Expired |
| US6440326B1 | Photoresist removing composition | Electricity | 19 | Expired |
| US6686322B1 | Cleaning agent and cleaning process using the same | Electricity | 18 | Expired |
| US6514352B2 | Cleaning method using an oxidizing agent, chelating agent and fluorine compound | Emerging Cross-Sectional Technologies | 17 | Expired |
| US5911836A | Method of producing semiconductor device and rinse for cleaning semiconductor device | Emerging Cross-Sectional Technologies | 16 | Expired |
| US5338462A | Active carbon materials, process for the preparation thereof and the use thereof | Chemistry; Metallurgy | 16 | Expired |
| US4776929A | Process for production of quaternary ammonium hydroxides | Chemistry; Metallurgy | 14 | Expired |
| US6458517B2 | Photoresist stripping composition and process for stripping photoresist | Physics | 12 | Expired |
| US5846695A | Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit | Electricity | 9 | Expired |
| US4521638A | Process for preparation of tertiary olefins | Emerging Cross-Sectional Technologies | 9 | Expired |
| US4013725A | Process for preparing hydroperoxide | Chemistry; Metallurgy | 6 | Expired |
| US4613684A | Process for the preparation of carboxylic acid esters | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6462005B1 | Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device | Electricity | 5 | Expired |
| US5393386A | Method for preparing aqueous quaternary ammonium hydroxide solution | Chemistry; Metallurgy | 5 | Expired |
| US6199567A | Method and apparatus for manufacturing semiconductor device | Emerging Cross-Sectional Technologies | 5 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.