Exposure apparatus
US5182615A · kind A · utility
59Cited by
6References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 1990 |
| Grant date | Jan 26, 1993 |
| Priority date | — |
| Expiry date | Aug 7, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7049
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.