Mass spectrometer for analyzing ultra trace element using plasma ion source
US5185523A · kind A · utility
8Cited by
1References
10Claims
0Family size
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Key dates
| Filing date | Mar 10, 1992 |
| Grant date | Feb 9, 1993 |
| Priority date | — |
| Expiry date | Mar 10, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/105
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A mass spectrometer for analyzing ultra trace element using plasma ion source comprising, a plasma generating means for ionizing sampling gas by generating plasma, a vaccum chamber for taking in ions of the sampling gas from a hole of the vacuum chamber, an ion lens and a mass analyzing portion, and an ion detector for detecting the ions which are passed through the ion lens and the mass analyzing portion, wherein further comprising, a moving mechanism for moving said plasma generating means according to a vacuum degree measured in the vacuum chamber so as to make the sensitivity of the mass spectrometer higher.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.