Method of manufacturing an X-ray exposure mask and device for controlling the internal stress of thin films
US5188706A · kind A · utility
246Cited by
6References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 16, 1990 |
| Grant date | Feb 23, 1993 |
| Priority date | — |
| Expiry date | Mar 16, 2010 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/017
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An X-ray mask can be manufactured by forming an X-ray transmitting thin film on a mask support, forming an X-ray absorber thin film on the X-ray transmitting thin film, and patterning the X-ray absorber thin film with a desired pattern to form an X-ray absorber pattern. Prior to the patterning, at least one inert element with an atomic number greater than that of neon is ion-implanted in the X-ray absorber thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.