Masaru Hori
54Patents
13h-index
98Co-inventors
87Inventor score
Filing activity: Mar 16, 1990 → May 5, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9793135B1 | Method of cyclic dry etching using etchant film | Electricity | 452 | Active |
| US10283353B2 | Method of reforming insulating film deposited on substrate with recess pattern | Electricity | 398 | Active |
| US5188706A | Method of manufacturing an X-ray exposure mask and device for controlling the internal stress of thin films | Performing Operations; Transporting | 246 | Expired |
| US8119530B2 | Pattern forming method and semiconductor device manufacturing method | Electricity | 181 | Active |
| US5302240A | Method of manufacturing semiconductor device | Electricity | 98 | Expired |
| US5707487A | Method of manufacturing semiconductor device | Emerging Cross-Sectional Technologies | 64 | Expired |
| US5445710A | Method of manufacturing semiconductor device | Electricity | 52 | Expired |
| US5411631A | Dry etching method | Chemistry; Metallurgy | 46 | Expired |
| US5259923A | Dry etching method | Electricity | 41 | Expired |
| US5980999A | Method of manufacturing thin film and method for performing precise working by radical control and apparatus for carrying out such methods | Electricity | 39 | Expired |
| US5240554A | Method of manufacturing semiconductor device | Emerging Cross-Sectional Technologies | 38 | Expired |
| US8551657B2 | Negative electrode for lithium secondary battery, method for preparing the negative electrode, lithium secondary battery having the negative electrode, and vehicle having the lithium secondary battery | Emerging Cross-Sectional Technologies | 28 | Active |
| US7632379B2 | Plasma source and plasma processing apparatus | Electricity | 17 | Expired |
| US8558169B2 | Sample substrate for laser desorption ionization-mass spectrometry, and method and device both using the same for laser desorption ionization-mass spectrometry | Physics | 8 | Active |
| US10504742B2 | Method of atomic layer etching using hydrogen plasma | Electricity | 8 | Active |
| US8610353B2 | Plasma generating apparatus, plasma processing apparatus and plasma processing method | Electricity | 5 | Active |
| US6501082B1 | Plasma deposition apparatus and method with controller | Electricity | 5 | Expired |
| US10720334B2 | Selective cyclic dry etching process of dielectric materials using plasma modification | Electricity | 3 | Active |
| US7393460B2 | Plasma processing method and plasma processing apparatus | Electricity | 3 | Expired |
| US7556970B2 | Method of repairing damaged film having low dielectric constant, semiconductor device fabricating system and storage medium | Electricity | 2 | Active |
| US7855788B2 | Spectroscopy method and spectroscope | Physics | 2 | Active |
| US10325781B2 | Etching method and etching apparatus | Electricity | 2 | Active |
| US9252000B2 | Microwave waveguide apparatus, plasma processing apparatus and plasma processing method | Electricity | 1 | Active |
| US9713241B2 | Reactive-species supply device and surface treatment apparatus | Electricity | 1 | Active |
| US10720337B2 | Pre-cleaning for etching of dielectric materials | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.