Pattern-forming method and radiation resist for use when working this pattern-forming method
US5192643A · kind A · utility
7Cited by
1References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 22, 1991 |
| Grant date | Mar 9, 1993 |
| Priority date | — |
| Expiry date | Jan 22, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method of forming a pattern by irradiating a resist, which comprises irradiating a resist composed mainly of a polymer or copolymer comprising structural units represented by the following general formula (1): ##STR1## where R represents a hydrocarbon group containing at least one Si atom, patternwise with an energy beam, and developing the irradiated resist pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.