Exposure method and projection exposure apparatus
US5194893A · kind A · utility
222Cited by
9References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 3, 1992 |
| Grant date | Mar 16, 1993 |
| Priority date | — |
| Expiry date | Mar 3, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70775
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction of one-dimensional movement. The substrate is also moved in a direction of optical axis of projection optical system when moved in the direction of one-dimension, such that a central part of transfer area on the substrate is located on a best focal plane of projection optical system upon scan exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.