Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
US5198034A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1991 |
| Grant date | Mar 30, 1993 |
| Priority date | — |
| Expiry date | Mar 4, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A rotatable substrate supporting mechanism for use in a chemical vapor deposition reaction chamber of the type used in producing semi-conductor devices is provided with a susceptor for supporting a single substrate, or wafer, for rotation about an axis normal to the center of the wafer. The mechanism is provided with a temperature sensing system for producing signals indicative of sensed temperatures taken at the center of the susceptor and at various points about the periphery thereof. A gas purging system is provided for inhibiting the flow of reactant gas in unwanted areas of the reaction chamber and in the supporting system itself. Rotational driving of the mechanism is accomplished by a variable speed motor under control of a circuit which stops and starts the rotation at controlled speeds and stops the rotation at a home position for enhancing the handling of the wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.