Photopolymerizable mixture, copying material containing same and process for producing highly heat-resistant relief structures wherein a trihalomethyl is the photoinitiator

US5198325A · kind A · utility

Assignee

• Hoechst GmbH · DE

Inventors

• Bernd Hupfer · Fresno Street, US
• Gerhard Buhr · Königstein, DE
• Charlotte Eckes · Mainz, DE

Key dates

• Filing date: May 26, 1988
• Grant date: Mar 30, 1993
• Expiry date: May 26, 2008

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0295
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A photopolymerizable mixture for producing relief structures composed of highly heat-resistant polymers is described which is composed essentially of a soluble prepolymer containing photosensitive radicals bound in an ester-like manner to carboxyl groups, monomers and a photoinitiator, wherein the photoinitiator carries at least one trihalomethyl group which reacts when exposed to light. Of advantage is the fact that, even after exposure times which are by a factor of 4 to 5 shorter compared with conventional photopolymerizable mixtures, sharp-edged resist images can be obtained with a resolution of less than 3 .mu.m.