Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound

US5200293A · kind A · utility

Assignee

• Ciba-Geigy · US

Inventors

• Reinhard Schulz · Hannover, DE
• Horst Munzel · Darmstadt, DE
• Ekkehard Bartmann · Langen (Hessen), DE

Key dates

• Filing date: Nov 14, 1991
• Grant date: Apr 6, 1993
• Expiry date: Nov 14, 2011

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/022
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Positive-working photoresist compositions containing 23-27%, based on said composition, of at least one compound of formula (I) ##STR1## wherein one of the substituents X is hydrogen or a group of formula II ##STR2## and the other substituents X are a group of formula II; and 6-11%, based on said composition, of at least one polyhydroxy compound of formula III ##STR3## wherein X is a direct bond, --O--, --S--, --SO.sub.2 --, --CO-- or C(R.sub.6 (R.sub.7)--, and R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or hydroxy, and R.sub.6 and R.sub.7 are each independently of the other hydrogen, --CH.sub.3 or --CF.sub.3. These compositions have particularly good profile contrast and exhibit insignificant fluctuations in line width.