Resist materials
US5200544A · kind A · utility
15Cited by
4References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 24, 1992 |
| Grant date | Apr 6, 1993 |
| Priority date | — |
| Expiry date | Jan 24, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A class of resist compositions sensitive to deep ultraviolet radiation includes a resin sensitive to acid and a composition that generates acid upon exposure to such radiation. A group of nitrobenzyl materials is particularly suitable for use as the acid generator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.