Spin coating apparatus having a horizontally linearly movable wafer holder
US5205867A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 14, 1991 |
| Grant date | Apr 27, 1993 |
| Priority date | — |
| Expiry date | Mar 14, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/162
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A semiconductor wafer 11 is mounted on an elongated member 18, one end of which is rotatable about a transverse axis (14), thereby to distribute a liquid on the upper surface of the wafer more evenly. In order to stabilize the rotation of the elongated member, a second elongated member is preferably attached end-to-end to the elongated member (18) and rotates with it. A counterweight (26) in the second elongated member moves during the rotation such that the distance between the wafer and the central axis and the distance between the center of the counterweight and the axis are substantially equal. The weight distribution is approximately symmetrical about the axis and the structure is dynamically stabilized. The counterweight and the wafer assembly may be moved during rotation by applying air pressure from a source (23) to pistons (13,26) in the two elongated member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.