Vapor deposition apparatus
US5205870A · kind A · utility
10Cited by
3References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 29, 1992 |
| Grant date | Apr 27, 1993 |
| Priority date | — |
| Expiry date | May 29, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/483
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An argon (Ar.sup.+) laser has a resonator. A reaction chamber is integrally formed in the resonator. A voltage is applied to electrodes, which discharge electricity to excite argon atoms in the resonator to produce a laser beam. The laser beam is continuously oscillated between total reflection mirrors disposed at opposite ends of the resonator. A substrate is disposed in the reaction chamber into which a material gas is introduced. The material gas absorbs the laser beam, to decompose and deposit as a thin film over the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.