Akio Ui
22Patents
6h-index
39Co-inventors
69Inventor score
Filing activity: May 29, 1992 → Jun 23, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5403630A | Vapor-phase growth method for forming S.sub.2 O.sub.2 films | Chemistry; Metallurgy | 414 | Expired |
| US6164295A | CVD apparatus with high throughput and cleaning method therefor | Electricity | 41 | Expired |
| US8821684B2 | Substrate plasma processing apparatus and plasma processing method | Electricity | 41 | Active |
| US10388544B2 | Substrate processing apparatus and substrate processing method | Electricity | 40 | Active |
| US5976992A | Method of supplying excited oxygen | Electricity | 19 | Expired |
| US5205870A | Vapor deposition apparatus | Chemistry; Metallurgy | 10 | Expired |
| US9934944B2 | Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure | Emerging Cross-Sectional Technologies | 4 | Active |
| US8545670B2 | Plasma processing apparatus and plasma processing method | Electricity | 4 | Active |
| US10332906B2 | Dry etching method and method for manufacturing semiconductor device | Electricity | 4 | Active |
| US8821744B2 | Substrate processing method and substrate processing apparatus | Electricity | 3 | Active |
| US7851367B2 | Method for plasma processing a substrate | Electricity | 3 | Active |
| US7247888B2 | Film forming ring and method of manufacturing semiconductor device | Electricity | 3 | Expired |
| US8548787B2 | Simulating a chemical reaction phenomenon in a semiconductor process | Physics | 1 | Active |
| US10381198B2 | Plasma processing apparatus and plasma processing method | Electricity | 1 | Active |
| US8252193B2 | Plasma processing apparatus of substrate and plasma processing method thereof | Electricity | 1 | Active |
| US9468698B2 | Gas processing apparatus | Performing Operations; Transporting | 1 | Active |
| US9583360B2 | Substrate processing apparatus and substrate processing method | Electricity | 1 | Active |
| US10672615B2 | Plasma processing apparatus and plasma processing method | Electricity | 0 | Active |
| US9799482B2 | Device manufacturing apparatus and manufacturing method of magnetic device using structure to pass ion beam | Electricity | 0 | Active |
| US11497110B2 | Dielectric barrier discharge electrode and dielectric barrier discharge device | Electricity | 0 | Active |
| US10518270B2 | Dust collector and air conditioner | Emerging Cross-Sectional Technologies | 0 | Active |
| US12087556B2 | Plasma processing apparatus and plasma processing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.