Low energy, steered ion beam deposition system having high current at low pressure
US5206516A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 29, 1991 |
| Grant date | Apr 27, 1993 |
| Priority date | — |
| Expiry date | Apr 29, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/055
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion beam deposition system in which ions of different masses and from different sources are independently steered into different parts of an analyzer magnet to be converged into a single wide beam which maintains a perpendicular relationship between the beam and the target. The beam is decelerated by a slit type deceleration lens to an energy suitable for deposition. The target is then scanned across the decelerated beam. The beam is maintained at high current and low pressure by confining electrons away from the magnet and/or adding energy to the low pressure atmosphere inside the analyzer magnet to produce a plasma of electrons and charged particles in order to provide adequate neutralizing of the space charge of the beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.