John H. Keller
58Patents
26h-index
47Co-inventors
88Inventor score
Filing activity: Jun 30, 1975 → Aug 29, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5505816A | Etching of silicon dioxide selectively to silicon nitride and polysilicon | Emerging Cross-Sectional Technologies | 290 | Expired |
| US5178739A | Apparatus for depositing material into high aspect ratio holes | Electricity | 276 | Expired |
| US5304279A | Radio frequency induction/multipole plasma processing tool | Electricity | 178 | Expired |
| US5241245A | Optimized helical resonator for plasma processing | Electricity | 121 | Expired |
| US5206516A | Low energy, steered ion beam deposition system having high current at low pressure | Electricity | 115 | Expired |
| US4600464A | Plasma etching reactor with reduced plasma potential | Electricity | 109 | Expired |
| US5463525A | Guard ring electrostatic chuck | Emerging Cross-Sectional Technologies | 71 | Expired |
| US5561585A | Electrostatic chuck with reference electrode | Emerging Cross-Sectional Technologies | 66 | Expired |
| US5767628A | Helicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channel | Electricity | 60 | Expired |
| US7241361B2 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | Electricity | 55 | Expired |
| US6051151A | Apparatus and method of producing a negative ion plasma | Electricity | 55 | Expired |
| US5866985A | Stable matching networks for plasma tools | Electricity | 55 | Expired |
| US5650032A | Apparatus for producing an inductive plasma for plasma processes | Electricity | 48 | Expired |
| US4158589A | Negative ion extractor for a plasma etching apparatus | Electricity | 48 | Expired |
| US5880034A | Reduction of semiconductor structure damage during reactive ion etching | Electricity | 46 | Expired |
| US5189446A | Plasma wafer processing tool having closed electron cyclotron resonance | Electricity | 45 | Expired |
| US7670455B2 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | Electricity | 43 | Active |
| US5207437A | Ceramic electrostatic wafer chuck | Emerging Cross-Sectional Technologies | 43 | Expired |
| US4846920A | Plasma amplified photoelectron process endpoint detection apparatus | Electricity | 41 | Expired |
| US5686796A | Ion implantation helicon plasma source with magnetic dipoles | Electricity | 36 | Expired |
| US6262538A | High density plasma tool with adjustable uniformity and stochastic electron heating for reduced gas cracking | Electricity | 34 | Expired |
| US5535507A | Method of making electrostatic chuck with oxide insulator | Emerging Cross-Sectional Technologies | 33 | Expired |
| US5783102A | Negative ion deductive source for etching high aspect ratio structures | Electricity | 31 | Expired |
| US4383177A | Multipole implantation-isotope separation ion beam source | Electricity | 30 | Expired |
| US8168957B2 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | Electricity | 30 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.