Interference removal
US5208644A · kind A · utility
5Cited by
4References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 1990 |
| Grant date | May 4, 1993 |
| Priority date | — |
| Expiry date | May 18, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32963
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved method for minimizing interferences from random noise and correlated fluctuations which obscure electrical signals converted from optical emissions. In particular, an improved method for the removal of interferences from optical emission signals during endpoint determination in dry etching processes for the fabrication of microelectronic devices which derives information in the presence of random noise, correlated fluctuations and periodic modulations of the plasma by maximizing the signal to random noise ratio and minimizing the obscuring effects of correlated fluctuation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.