Herbert E. Litvak
24Patents
13h-index
25Co-inventors
77Inventor score
Filing activity: May 18, 1990 → Nov 24, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6010538A | In situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication link | Physics | 127 | Expired |
| US6068539A | Wafer polishing device with movable window | Performing Operations; Transporting | 117 | Expired |
| US5499733A | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | Electricity | 91 | Expired |
| US6254459A | Wafer polishing device with movable window | Performing Operations; Transporting | 86 | Expired |
| US5695660A | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | Electricity | 80 | Expired |
| US5308447A | Endpoint and uniformity determinations in material layer processing through monitoring multiple surface regions across the layer | Electricity | 53 | Expired |
| US6027760A | Photoresist coating process control with solvent vapor sensor | Performing Operations; Transporting | 33 | Expired |
| US6077452A | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | Electricity | 32 | Expired |
| US5190614A | Method of endpoint detection and structure therefor | Physics | 31 | Expired |
| US6641470B1 | Apparatus for accurate endpoint detection in supported polishing pads | Performing Operations; Transporting | 22 | Expired |
| US6426232B1 | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | Electricity | 21 | Expired |
| US5891352A | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | Electricity | 20 | Expired |
| US6110752A | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | Electricity | 14 | Expired |
| US6413147B1 | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment | Electricity | 12 | Expired |
| US5786886A | Interference removal | Electricity | 9 | Expired |
| US7072028B2 | Method and apparatus for chemical monitoring | Emerging Cross-Sectional Technologies | 9 | Expired |
| US5414504A | Interference removal | Electricity | 9 | Expired |
| US5208644A | Interference removal | Electricity | 5 | Expired |
| US5064269A | Light collection method and apparatus | Physics | 4 | Expired |
| US5946082A | Interference removal | Electricity | 4 | Expired |
| US7580119B2 | Method and apparatus for chemical monitoring | Emerging Cross-Sectional Technologies | 4 | Active |
| US7456939B2 | Method and apparatus for chemical monitoring | Emerging Cross-Sectional Technologies | 2 | Active |
| US6612902B1 | Method and apparatus for end point triggering with integrated steering | Performing Operations; Transporting | 2 | Expired |
| US7217371B2 | Optical control interface between controller and process chamber | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.