Lithographic apparatus and method
US5209813A · kind A · utility
23Cited by
0References
55Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 1991 |
| Grant date | May 11, 1993 |
| Priority date | — |
| Expiry date | Oct 24, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31796
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A lithographic method and a lithographic apparatus ar disclosed in which the height of a silicon wafer making up an object of lithography is accurately measured. A lithographic apparatus such as an electron beam apparatus having a height-measuring instrument built therein is effectively used for forming a pattern on the order of submicrons.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.