Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
US5210000A · kind A · utility
16Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 6, 1992 |
| Grant date | May 11, 1993 |
| Priority date | — |
| Expiry date | Feb 6, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.