Baffle/settling chamber for a chemical vapor deposition equipment
US5211729A · kind A · utility
29Cited by
6References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 30, 1991 |
| Grant date | May 18, 1993 |
| Priority date | — |
| Expiry date | Aug 30, 2011 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D45/08
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A baffle/settling chamber removes solid particulates from the exhaust of a semiconductor deposition equipment while reducing pressure fluctuation in the exhaust to provide a more uniform deposition of chemicals. A container having an inlet baffle plate, an outlet baffle plate and three settling plates disposed there between are disposed in a chamber and reside serially in the exhaust flow.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.