Sematech, Inc.
97Patents
38Active
97Granted
48Portfolio score
Filing activity: Jul 24, 1990 → Apr 4, 2013 · 26 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5674787A | Selective electroless copper deposited interconnect plugs for ULSI applications | Emerging Cross-Sectional Technologies | 640 | Expired |
| US5695810A | Use of cobalt tungsten phosphide as a barrier material for copper metallization | Electricity | 606 | Expired |
| US5824599A | Protected encapsulation of catalytic layer for electroless copper interconnect | Emerging Cross-Sectional Technologies | 459 | Expired |
| US5891513A | Electroless CU deposition on a barrier layer by CU contact displacement for ULSI applications | Emerging Cross-Sectional Technologies | 450 | Expired |
| US5830805A | Electroless deposition equipment or apparatus and method of performing electroless deposition | Emerging Cross-Sectional Technologies | 292 | Expired |
| US5062446A | Intelligent mass flow controller | Emerging Cross-Sectional Technologies | 169 | Expired |
| US5840629A | Copper chemical mechanical polishing slurry utilizing a chromate oxidant | Electricity | 162 | Expired |
| US6100184A | Method of making a dual damascene interconnect structure using low dielectric constant material for an inter-level dielectric layer | Emerging Cross-Sectional Technologies | 148 | Expired |
| US5474865A | Globally planarized binary optical mask using buried absorbers | Physics | 146 | Expired |
| US5344365A | Integrated building and conveying structure for manufacturing under ultraclean conditions | Electricity | 118 | Expired |
| US5478435A | Point of use slurry dispensing system | Performing Operations; Transporting | 113 | Expired |
| US5479340A | Real time control of plasma etch utilizing multivariate statistical analysis | Electricity | 98 | Expired |
| US5614444A | Method of using additives with silica-based slurries to enhance selectivity in metal CMP | Electricity | 91 | Expired |
| US5364510A | Scheme for bath chemistry measurement and control for improved semiconductor wet processing | Physics | 90 | Expired |
| US5467013A | Radio frequency monitor for semiconductor process control | Electricity | 86 | Expired |
| US5159267A | Pneumatic energy fluxmeter | Electricity | 83 | Expired |
| US5504328A | Endpoint detection utilizing ultraviolet mass spectrometry | Electricity | 82 | Expired |
| US5572398A | Tri-polar electrostatic chuck | Electricity | 82 | Expired |
| US5159264A | Pneumatic energy fluxmeter | Electricity | 81 | Expired |
| US5736457A | Method of making a damascene metallization | Electricity | 77 | Expired |
| US5472561A | Radio frequency monitor for semiconductor process control | Electricity | 74 | Expired |
| US5846398A | CMP slurry measurement and control technique | Performing Operations; Transporting | 73 | Expired |
| US5770982A | Self isolating high frequency saturable reactor | Electricity | 67 | Expired |
| US5866031A | Slurry formulation for chemical mechanical polishing of metals | Chemistry; Metallurgy | 61 | Expired |
| US5325019A | Control of plasma process by use of harmonic frequency components of voltage and current | Electricity | 59 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.