Resist material and process for use
US5212047A · kind A · utility
15Cited by
6References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 18, 1992 |
| Grant date | May 18, 1993 |
| Priority date | — |
| Expiry date | Feb 18, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.