High temperature rectifying contact
US5212401A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Jul 25, 1991 |
| Grant date | May 18, 1993 |
| Priority date | — |
| Expiry date | Jul 25, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/64
Abstract
A rectifying contact for use at high temperatures including a monocrystalline semiconducting diamond layer on a substrate and a heteroepitaxial metal layer thereon. The metal layer has a lattice match with the diamond and is deposited on the diamond substantially in atomic registry therewith. The metal and diamond form a rectifying contact which has good mechanical adhesion and provides stable rectifying operation at elevated temperatures. The metal layer may be formed by deposition in an ultra-high vacuum. In alternate embodiments, the metal layer may be formed on a monocrystalline semiconducting diamond substrate or on at least one monocrystalline diamond area of a textured polycrystalline layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.