Patent · US Expired

High temperature rectifying contact

US5212401A · kind A · utility

6Cited by
4References
12Claims
0Family size

Assignees

Inventors

Key dates

Filing dateJul 25, 1991
Grant dateMay 18, 1993
Priority date
Expiry dateJul 25, 2011

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D64/64

Abstract

A rectifying contact for use at high temperatures including a monocrystalline semiconducting diamond layer on a substrate and a heteroepitaxial metal layer thereon. The metal layer has a lattice match with the diamond and is deposited on the diamond substantially in atomic registry therewith. The metal and diamond form a rectifying contact which has good mechanical adhesion and provides stable rectifying operation at elevated temperatures. The metal layer may be formed by deposition in an ultra-high vacuum. In alternate embodiments, the metal layer may be formed on a monocrystalline semiconducting diamond substrate or on at least one monocrystalline diamond area of a textured polycrystalline layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.