Patent · US Expired

Method of mounting silicon wafers on metallic mounting surfaces

US5215244A · kind A · utility

41Cited by
14References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 24, 1992
Grant dateJun 1, 1993
Priority date
Expiry dateFeb 24, 2012

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/12042
  • WIPO fieldMechanical elements
  • WIPO sectorMechanical engineering

Abstract

A method of mounting a semiconductor wafer (10) on a metallic mounting surface, particularly during manufacture of valves with macromechanical valve bodies (20), features the steps of applying a metallization (11) to at least one major surface of the semiconductor wafer, and thereafter soldering the thus-metallized major surface, either wholly or in localized surface areas, to the metallic mounting surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.