Silicon etching process using polymeric mask, for example, to form V-groove for an optical fiber coupling
US5217568A · kind A · utility
32Cited by
8References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 3, 1992 |
| Grant date | Jun 8, 1993 |
| Priority date | — |
| Expiry date | Feb 3, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/3652
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for etching a silicon substrate to form a feature such as a V-groove, utilizes a coating formed of an alkaline resistance polymer. A preferred polymer is poly(benzocyclobutene) resin. The coating is applied to the substrate and removed form a selected region whereupon the underlying silicon is etched with an alkaline solution. In one aspect, an optical fiber is inserted in the etched groove and coupled to an optical waveguide embedded within the coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.