Method for fabricating high density DRAM reticles
US5227269A · kind A · utility
14Cited by
4References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 22, 1990 |
| Grant date | Jul 13, 1993 |
| Priority date | — |
| Expiry date | Jun 22, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70458
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of reticle fabrication is disclosed which will reduce e-beam write time by two orders of magnitude for a 64 megabit DRAM. The method involves the mix of using both e-beam and optical lithography on a single reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.