Method of forming metal regions
US5230970A · kind A · utility
8Cited by
4References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 28, 1992 |
| Grant date | Jul 27, 1993 |
| Priority date | — |
| Expiry date | May 28, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/165
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A process of radiation-induced formation of a uniform metal or metal oxide region suitable for device application or for repairing transparent defects in pattern metal films of lithographic masks has been found. The process requires that the heat evolved during the radiation-induced reactions be carefully limited to produce the desired uniformity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.