Microwave energized deposition process wherein the deposition is carried out at a pressure less than the pressure of the minimum point on the deposition system's Paschen curve
US5231048A · kind A · utility
5Cited by
9References
10Claims
0Family size
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Key dates
| Filing date | Dec 23, 1991 |
| Grant date | Jul 27, 1993 |
| Priority date | — |
| Expiry date | Dec 23, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0262
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The glow discharge deposition of thin film materials is most advantageously carried out at a pressure which is less than the pressure of the minimum point on the deposition system's Paschen curve and at a power which is in excess of the minimum power required to sustain a deposition plasma at the particular process pressure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.