Plasma generating apparatus employing capacitive shielding and process for using such apparatus
US5234529A · kind A · utility
218Cited by
1References
12Claims
0Family size
Inventor
Key dates
| Filing date | Oct 10, 1991 |
| Grant date | Aug 10, 1993 |
| Priority date | — |
| Expiry date | Oct 10, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0266
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma generating apparatus includes a plasma containing region and an R.F. coil for generating R.F. electric fields within the plasma region for creating a plasma from a gas flowed through the region. A capacitive shield is disposed between the coil and the plasma region for limiting the amount of capacitive coupling while not completely eliminating it, between the R.F. coil and the plasma region. The shield can include a means for varying the shielding effect thereof during processes employing the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.