Wayne Johnson
68Patents
24h-index
50Co-inventors
91Inventor score
Filing activity: Oct 7, 1985 → Feb 28, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6740853B1 | Multi-zone resistance heater | Electricity | 639 | Expired |
| US7166233B2 | Pulsed plasma processing method and apparatus | Electricity | 275 | Expired |
| US5234529A | Plasma generating apparatus employing capacitive shielding and process for using such apparatus | Electricity | 218 | Expired |
| US4918031A | Processes depending on plasma generation using a helical resonator | Emerging Cross-Sectional Technologies | 178 | Expired |
| US6313584A | Electrical impedance matching system and method | Electricity | 132 | Expired |
| US6535785B2 | System and method for monitoring and controlling gas plasma processes | Electricity | 111 | Expired |
| US6392187B1 | Apparatus and method for utilizing a plasma density gradient to produce a flow of particles | Electricity | 107 | Expired |
| US5269847A | Variable rate distribution gas flow reaction chamber | Emerging Cross-Sectional Technologies | 107 | Expired |
| US4789771A | Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus | Chemistry; Metallurgy | 82 | Expired |
| US6757673B2 | Displaying hierarchial relationship of data accessed via subject index | Emerging Cross-Sectional Technologies | 81 | Expired |
| US7311782B2 | Apparatus for active temperature control of susceptors | Electricity | 80 | Expired |
| US6332961A | Device and method for detecting and preventing arcing in RF plasma systems | Electricity | 76 | Expired |
| US6863020B2 | Segmented electrode apparatus for plasma processing | Electricity | 70 | Expired |
| US4798165A | Apparatus for chemical vapor deposition using an axially symmetric gas flow | Chemistry; Metallurgy | 70 | Expired |
| US6740842B2 | Radio frequency power source for generating an inductively coupled plasma | Electricity | 63 | Expired |
| US6351683B1 | System and method for monitoring and controlling gas plasma processes | Electricity | 51 | Expired |
| US4654509A | Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus | Chemistry; Metallurgy | 45 | Expired |
| US7075031B2 | Method of and structure for controlling electrode temperature | Electricity | 33 | Expired |
| US7102292B2 | Method and device for removing harmonics in semiconductor plasma processing systems | Electricity | 32 | Expired |
| US6819053B2 | Hall effect ion source at high current density | Electricity | 31 | Expired |
| US7019253B2 | Electrically controlled plasma uniformity in a high density plasma source | Electricity | 28 | Expired |
| US7340472B2 | Organizing and storing hierarchical data in a database having dual structures | Emerging Cross-Sectional Technologies | 28 | Expired |
| US7066703B2 | Chuck transport method and system | Emerging Cross-Sectional Technologies | 27 | Expired |
| US6891124B2 | Method of wafer band-edge measurement using transmission spectroscopy and a process for controlling the temperature uniformity of a wafer | Electricity | 27 | Expired |
| US5455070A | Variable rate distribution gas flow reaction chamber | Emerging Cross-Sectional Technologies | 24 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.