X-ray permeable membrane for X-ray lithographic mask
US5234609A · kind A · utility
10Cited by
10References
4Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 16, 1992 |
| Grant date | Aug 10, 1993 |
| Priority date | — |
| Expiry date | Jun 16, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/36
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is an X-ray-permeable membrane for X-ray lithographic mask for fine patterning in the manufacture of semiconductor devices having good transparency to visible light and exhibiting excellent resistance against high-energy beam irradiation. The membrane has a chemical composition expressed by the formula SiC.sub.x N.sub.y and can be prepared by the thermal CVD method in an atmosphere of a gaseous mixture consisting of gases comprising, as a group, the elements of silicon, carbon and nitrogen such as a ternary combination of silane, propane and ammonia.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.