Meguru Kashida
45Patents
13h-index
38Co-inventors
81Inventor score
Filing activity: Apr 4, 1986 → Nov 8, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7776473B2 | Silicon-silicon oxide-lithium composite, making method, and non-aqueous electrolyte secondary cell negative electrode material | Emerging Cross-Sectional Technologies | 39 | Active |
| US5723860A | Frame-supported pellicle for photomask protection | Emerging Cross-Sectional Technologies | 30 | Expired |
| US4849491A | Curable organopolysiloxane composition | Chemistry; Metallurgy | 29 | Expired |
| US5693382A | Frame-supported pellicle for dustproof protection of photomask in photolithography | Emerging Cross-Sectional Technologies | 23 | Expired |
| US4726964A | Method for imparting releasability to a substrate surface | Chemistry; Metallurgy | 21 | Expired |
| US5286567A | Pellicle for photolithographic mask | Emerging Cross-Sectional Technologies | 21 | Expired |
| US5209996A | Membrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the same | Emerging Cross-Sectional Technologies | 21 | Expired |
| US5139633A | Film-forming on substrate by sputtering | Electricity | 20 | Expired |
| US5378514A | Frame-supported pellicle for photolithography | Emerging Cross-Sectional Technologies | 18 | Expired |
| US6436586B1 | Pellicle with a filter and method for production thereof | Physics | 17 | Expired |
| US5691088A | Pellicle for protection of photolithographic mask | Emerging Cross-Sectional Technologies | 16 | Expired |
| US5616927A | Frame-supported pellicle for dustproof protection of photomask | Physics | 14 | Expired |
| US5470621A | Frame-supported pellicle for dustproof protection of photomask | Physics | 14 | Expired |
| US5370951A | Frame-supported pellicle for protection of photolithographic mask | Emerging Cross-Sectional Technologies | 13 | Expired |
| US5834143A | Frame-supported dustproof pellicle for photolithographic photomask | Physics | 13 | Expired |
| US5132366A | Curable silicone composition | Chemistry; Metallurgy | 11 | Expired |
| US5300348A | Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive | Emerging Cross-Sectional Technologies | 11 | Expired |
| US5326649A | X-ray transmitting membrane for mask in x-ray lithography and method for preparing the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US5234609A | X-ray permeable membrane for X-ray lithographic mask | Chemistry; Metallurgy | 10 | Expired |
| US5729325A | Pellicle for a mask or substrate | Emerging Cross-Sectional Technologies | 10 | Expired |
| US5419972A | Frame-supported pellicle for dustproof protection of photomask | Emerging Cross-Sectional Technologies | 10 | Expired |
| US5199055A | X-ray lithographic mask blank with reinforcement | Physics | 9 | Expired |
| US5327808A | Method for the preparation of a frame-supported pellicle for photolithography | Emerging Cross-Sectional Technologies | 8 | Expired |
| US4983701A | Silicone composition for rendering surfaces non-adherent | Chemistry; Metallurgy | 7 | Expired |
| US6350549B1 | Jig for producing pellicle and method for producing pellicle using the same | Emerging Cross-Sectional Technologies | 7 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.