Segmented mask and exposure system for x-ray lithography
US5235626A · kind A · utility
27Cited by
9References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1991 |
| Grant date | Aug 10, 1993 |
| Priority date | — |
| Expiry date | Oct 22, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70475
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An x-ray lithography mask design provides for replacement of a single large area membrane with a set of smaller membranes (segments) fabricated on a single mask substrate forming a segmented mask. The segments are arranged serially so that they can be sequentially aligned and exposed by a shaped x-ray beam. Thus, the segmented mask is a series of mask membrane segments mounted together.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.