Chester Wasik
5Patents
4h-index
8Co-inventors
50Inventor score
Filing activity: Dec 4, 1978 → Mar 4, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4367044A | Situ rate and depth monitor for silicon etching | Physics | 57 | Expired |
| US5235626A | Segmented mask and exposure system for x-ray lithography | Physics | 27 | Expired |
| US4293224A | Optical system and technique for unambiguous film thickness monitoring | Physics | 24 | Expired |
| US6683305B1 | Method to obtain transparent image of resist contact hole or feature by SEM without deforming the feature by ion beam | Physics | 5 | Expired |
| US7094616B2 | High resolution cross-sectioning of polysilicon features with a dual beam tool | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.