Patent · US Expired

Apparatus for thin-coating processes for treating substrates of great surface area

US5237152A · kind A · utility

5Cited by

8References

5Claims

0Family size

Assignee

Leybold GmBH · DE

Inventors

Rainer Gegenwart · Rödermark, DE
Roland Gesche · Seligenstadt, DE
Karl-Heinz Kretschmer · Hamburg, DE
Jochen Ritter · Laubach, DE
Sonja Noll · Frankfurt, DE

Key dates

Filing date	Sep 30, 1991
Grant date	Aug 17, 1993
Priority date	—
Expiry date	Sep 30, 2011

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32192
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Apparatus for thin-coating processes for the treatment of substrates (8) of large surface area using a plasma (6) which is excited by microwaves (M) and the latter are coupled from a source by means of a waveguide (1) consisting of at least one hollow conductor (1), as well as by means of a horn antenna, into a plasma chamber (5), the waveguide (W) having a substantially rectangular aperture, an area is provided at the end of the hollow conductor (Q) with a slit-like constriction (Q), a rectangular horn (2) adjoins this area, and a compensation area (3) is provided between the largest aperture of the rectangular horn (2), as well as of the plasma chamber (5).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.